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The laser table is
located near the center of our lab. A Krypton ion laser is located in
the left center of the photo. The red dot is light scattered from the
676-nm beam emitted by this laser. Two mirrors steer the light into the
color-center laser located on the front corner of the table. This red
light excites a lithium-doped RbCl crystal that is housed inside the
shiny metal dewar at the far end of the color-center laser. Liquid
nitrogen inside the dewar keeps the color center crystal cold and
suppresses the recombination and annihilation of the optically active
color center sites in the laser gain medium. Other items visible on the
laser table include a wavemeter for absolute wavelength determination,
two Fabry-Perot interferometers with free spectral ranges of 300MHz and
1.5GHz, and detectors for laser power measurements. (1GHz corresponds
to about 0.03 cm-1, and 1MHz corresponds to about 0.00003 cm-1 in the
mid-infrared.) The oscilloscope on the right displays the signal from
one of the scanning Fabry-Perot interferometers and indicates that the
color center laser is lasing on a single longitudinal mode. The
molecular beam machine is located behind the laser table. The end of
the ultrahigh vacuum main chamber and the light blue stand on which it
rests are visible near the large LN2 dewar.
Taking a couple of steps to the left the lasers are in full view.
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The long black Coherent
laser (left) is the krypton ion laser that pumps the Burleigh F-center
laser (right). The molecular beam machine is visible in the background
Walking around the right
hand side of laser table, we see the beam machine.
The main chamber is in
the foreground with the interconnected second and first differential
pumping stages and the molecular beam source chamber extending to the
left.
The differential pumping
stages further collimate the molecular beam and reduce the effusive gas
load on the main chamber. Thus, nearly all molecules interacting with
the nickel surface in the main chamber originate from the supersonic
expansion, and not from background gases that may be present in the
molecular beam source.
Surface chemistry is
highly sensitive to the presence of contaminants on the surface of
interest. In order to ensure that our surface is clean and free of
unknown contamination, the nickel surface we study is housed in an
ultrahigh vacuum chamber (the main chamber), whose pressure is
maintained at about 1x10-10 Torr. This level of vacuum minimizes the
number of gas-phase species that may interact with, stick to, and
contaminate the surface under study. The (brown) manipulator on top of
the main chamber and the cold finger extending down from it support the
nickel sample. We use a 1-cm disk cut from a single crystal of metallic
nickel and polished to expose the (111) (hexagonal-close-packed) or
(100) (square surface mesh) crystalline face. The manipulator allows
the nickel crystal to be rotated about a vertical axis and translated
in three dimensions within the UHV environment. The RF box in front of
the main chamber provides RF and DC potentials to the quadrupole mass
spectrometer (QMS) in the main chamber. The QMS is located on the
machine's beam axis. It is mounted on the end of the main chamber by
the small flange visible just above the RF box.
All four compartments of
the machine are independently pumped by diffusion pumps (DPs). The DPs
are backed by direct drive mechanical pumps that are located in a
separate pump room behind the white wall. The main chamber and second
stage are protected from backstreaming DP oil by liquid nitrogen-cooled
(LN2) traps. The white trap under the main chamber is clearly visible
in the picture. The first stage is protected by a water baffle. The
source chamber has no trap to keep the pumping speed high.
The first and second
stages and the main chamber can be isolated from their DPs by gate
valves.The main chamber and second stage have pneumatic gate valves
that are individually interlocked to the DP's cooling water flow and DP
temperature, the foreline pressure, and the cryogen level in the
corresponding LN2 trap.
Walking toward the left
along the machine, we end up at the source chamber end. The following
picture shows the machine with the source in the foreground.
The source chamber
houses the supersonic molecular beam source, which consists of a metal
nozzle with a 25um diameter orfice and a 1mm diameter skimmer. The
plexiglass box on top of the source chamber contains a step-down
tranformer that provides the high current needed to heat the nozzle
resistively.
The first differential
pumping stage, located in the middle section of the machine, contains a
multi-pass cell where infrared light from the color-conter laser
intersects the molecular beam and a mechanical shutter for precise
control of molecular beam exposure times.
The second differential
pumping stage lies between the end of the chamber's middle section and
a vertical wall welded inside the right-hand part of the chamber. This
wall separates the second stage from the main chamber. The second
differential stage contains a slotted chopper wheel that can rotate at
speeds up to 400Hz. This wheel modulates the molecular beam and, in
conjunction with a quadrupole mass spectrometer located on the beam
axis in the main chamber, permits time-of-flight measurements that
characterize the translational energy of molecules in the supersonic
molecular beam. The second differential stage also contains a
bolometric detector for direct measurement of infrared absorption by
molecules in the molecular beam. A sliding valve in the second
differential chamber can completely isolate the ultrahigh vacuum main
chamber from the source and differential pumping stages.
From this point, turning
to the left, we can view some of the machine's control electronics.
All the controls at this
end of the machine are home built. The chopper motor driver (top right
and top left panels), the automatic LN2-trap controller (red
rectangles), and the foreline pressure gauges (middle right) are not
labeled in the picture.
Looking along the back
side of the machine, one sees the remaining controls next to the main
chamber. The machine itself is now on your immediate right.
The left rack (gray)
contains all the controls for the electron gun and hemispherical
electron energy analyzer that comprise the auger electron spectrometer,
as well as the ion gauge controllers for the 2nd differential pumping
stage and main chamber. The right rack (blue) contains the QMS
controller. Variable transformers for the main chamber bake-out heaters
and an ion pump controller are also located in these racks. On the
right hand side of the picture one can see the closest of the pneumatic
gate valves and a part of the hemispherical analyzer that is wrapped up
in aluminum foil for bake-out.
Turning to the right and
looking into the main chamber through a large window, one sees the
nickel crysal at the end of the cold finger.
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The nickel crystal is suspened from two tungsten rods extending from
the bottom of the cold finger. It is surrounded by a copper cold shield
that minimizes radiative heating of the crystal by the chamber walls.
The cold shield is in thermal contact with a LN2 reservoir. A thoriated
tungsten filament located behind the crystal permits electron
bombardment heating of the crystal. Liquid nitrogen cooling coupled
with electron bombardment heating permits the crystal temperature to be
varied from 78K to over 1000K. The entire crystal support assembly can
be rotated around a vertical axis and translated in 3 dimensions.
Combinations of crystal rotation and translation position the crystal
for dosing (the molecular beam enters the main chamber from the right
in this picture), argon ion sputter cleaning, or for auger electron
spectroscopy, electron energy loss spectroscopy, or temperature
programmed desorption measurements.
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